Disilane decomposition. , 1969, 73, 3912. A Volume: 109 Page (s): 4911 - 4920 Year: 2005 Reference type: Journal article Squib: 2005MAT/KLI4911-4920 Reaction: 4 + 2 → 2 + H 3 SiSiH Reaction order: 2 Temperature: 300 - 1500 K Rate expression: 8. Thermal decomposition of disilane was investigated using time-of-flight (TOF) mass spectrometry coupled with vacuum ultraviolet single-photon ionization (VUV-SPI) at a temperature range of 675-740 K and total pressure of 20-40 Torr. E. Results and Discussion These results demonstrated that in the lithium chloride catalyzed decomposition of disilane in the presence of excess methylsilane or trimethylsilane, the disilane is completely converted to silane and a polymer while the alkylsilane is recovered unreacted. ; Tonokura, K. Dec 1, 1990 ยท The mechanisms of disilane surface decomposition on Si (111)-7 × 7 have been studied for surface temperatures (Ts) from 80 to 500°C using temperature programmed desorption (TPD), static secondary ion mass spectrometry (SSIMS), and low energy electron diffraction (LEED). Shock-induced kinetics of the disilane decomposition and silylene reactions with trimethylsilane and butadiene J. dichlorosilane decomposition than the corresponding direct reaction SiH2Cl2 f SiCl2 + H2, which has a significant activation barrier. At low coverage, disilane adsorbs dissociatively to produce adsorbed SiH3 groups which are randomly distributed on the surface. np pwznc veo5aj qb00 fcdw x4v5 ijps oyvd3 oqe9 ksvl2c